W06 Cross-stack Explorations of Ferroelectric-based Logic and Memory Solutions for At-Scale Compute Workloads
This workshop will speak to research with respect to ferroelectrics at all levels of the design stack.
- It will begin by discussing ferroelectric device concepts (e.g., front end of line (FEOL) and back end of line (BEOL) ferroelectric field effect transistors (FeFETs), ferro-based NAND, FeRAM, etc. as well as modeling efforts).
- Talks will effectively consider ferroelectrics from the “bottom-up” by addressing (a) how materials-based design-levers may influence device behavior (i.e., how might we optimize a device for a figure of merit that most benefits an application-level workload) and (b) new research in AI-guided materials discovery.
- Subsequently, talks will consider the use of ferroelectric devices in novel circuits and/or memory architectures (e.g., associative memories, crossbar-based structures, and ferroelectric solutions where computation is done via charge sharing).
- Novel algorithmic solutions based on ferroelectric devices, as well as how one might develop compiler support for technology-enabled, IMC solutions will also be discussed.
This workshop will include a submission-based poster-session to maximize engagement from the DATE community.
Submissions may be made at: https://easychair.org/conferences/?conf=ferrodate25
- Extended abstract submission: 31 January 2025
- Notification of acceptance: 14 February 2025
- Final version of the extended abstract: 21 March 2025
Ferroelectric Device Concepts, Modeling, and Materials
This session begins with discussions of various ferroelectric device concepts including front-end-of-line (FEOL) and back-end-of-line (BEOL) ferroelectric field effect transistors (FeFET), ferro-based NAND memory, ferroelectric random access memory (FeRAM), and ferroelectric tunneling junctions (FTJs). Modeling efforts, as well as how artificial intelligence might be used for material science-based design space explorations will also be discussed.
Prospects for FEOL and BEOL Ferroelectric Devices
Ferro-based NAND
FeRAM
Prospects of Ferroelectric Tunneling Junctions
Modeling Ferroelectric Devices
Ferroelectric Field-Effect Transistors (FeFETs) are a promising technology with immense potential for in-memory computing and AI acceleration. However, modeling their reliability remains a significant challenge due to multiple sources of variability. Design-time variability from process variations, run-time fluctuations driven by temperature effects, and the inherent stochasticity of ferroelectric domain switching—rooted in its probabilistic nature—make accurate reliability prediction highly complex. Without robust reliability models, it is impossible to ensure the accuracy and dependability of FeFET-based AI accelerator systems, which directly impacts the precision and effectiveness of AI algorithms. This talk presents a holistic framework for reliability estimation, seamlessly integrating insights from device physics to circuit-level analysis. We also highlight the transformative role of deep learning in addressing these challenges, demonstrating how it enables precise reliability modeling and unlocks the full potential of FeFET technology for next-generation computing.
AI Guided Materials Discovery
Poster Session
Architectures, Applications, and Compilation Techniques for Ferroelectric Devices
This session begins by considering in-memory computing (IMC) solutions based on ferroelectric device concepts. Recent work with respect to ferroelectric content addressable memories, crossbar arrays, as well as charge sharing architectures (that can also perform associative memory and MAC operations) will all be discussed. The session concludes with a discussion of recent work relating to compilation techniques and higher-level programming abstractions for ferroelectric IMC solutions.
Ferroelectric Solutions for Content Addressable Memories
Ferroelectric Nonvolatile Capacitor (nvCap) for Charge Domain Compute-in-Memory
Non-volatile ferroelectric capacitor (nvCap) that leverages the small-signal non-destructive read is a new concept to the ferroelectric memory family. nvCap overcomes the endurance limitation imposed by the destructive read in conventional ferroelectric random access memory (FeRAM) that relies on large-signal polarization switching. nvCap is also a promising candidate to enable the charge domain computation in a capacitive crossbar array for in-memory computing that only consumes dynamic power. The key engineering goal of nvCap is to optimize a asymmetric C-V characteristics to open up the large capacitance on/off ratio at DC zero voltage. In this talk, we present the progresses of our work on optimizing the nvCap device. We first introduce the HZO-based MFM nvCap that demonstrates the proof-of-concept, and present the FeFET-based MFS nvCap that improves capacitance on/off ratio with reliability/scaling analysis. Finally we report our new results on BEOL-compatible MFS nvCap based on a oxide semiconductor layer.
Charge Sharing Architectures with Ferroelectric Devices
Compiler Support for Ferroelectric Compute-in-Memory Solutions (and beyond)
Compute-in-Memory (CIM) is a promising non-von Neumann computing paradigm that promises unprecedented improvements in performance and energy efficiency. Moving past manual designs, automation will be key to unleash the potential of CIM for multiple application domains and to accelerate cross-layer design cycles. This talks reports on an ongoing effort to build a high-level compiler infrastructure for different CIM approaches, built with MLIR to abstract from individual technologies to foster re-use. This includes abstractions and optimizations flows for logic-in memory, content-addressable memories, arithmetic operations in crossbars, and near-memory architectures. We also report on recent results retargeting the compiler for novel ferroelectric cells, exploring different memory modalities.